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APO Objective

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APO Objective

Motic's Plan Apochromat objectives provide the working distances at the numerical aperture values needed. Covering magnification ranges from 2x to 100x, the Plan Apochromat objectives are also available with the unique option of parfocality adjustment. Furthermore, Motic also provides you Plan Apo NIR 20X and 50X to fit a wide range of laser applications, such as laser-cutting fine-films of semiconductors and of liquid crystal substrates and much more. Designed to focus within the depth of focus, even when the laser wavelength used changes from the visible radiation (wavelength 532mm) to the near-infrared radiation range (wavelength 1064mm). The mounting thread is M26 x 1/36" (0.706) for integration to existing systems. Please refer to Motic's Plan Apochromat catalogue for further information.


  
APO Objective

Home > Products > Industrial Products > Probe Station Microscopes > APO Objective

Extra Long Working Distance Objectives



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PLAN APO ELWD PA Specification Details
N.A. W.D (mm) F (mm) R (μm) D.F (μm)

F.V.O(mm)
(Ø24 eyepiece)

F.V.O(VxH,mm)
(1/2" chip sensor)

F.V.O(VxH,mm)
(2/3" chip sensor)

ELWD 2X PA 0.055 34.0 100 5.0 91 Ø 12 2.4 x 3.2 3.3 x 4.4
ELWD 5X PA 0.140 34.0 40 2.0 14 Ø 4.8 0.96 x 1.28 1.32 x 1.76
ELWD 10X PA 0.280 33.5 20 1.0 3.5 Ø 2.4 0.48 x 0.64 0.66 x 0.88
ELWD 20X PA 0.420 20.0 10 0.7 1.6 Ø 1.2 0.24 x 0.32 0.33 x 0.44
PLAN APO ELWD Specification Details
N.A. W.D (mm) F (mm) R (μm) D.F (μm)

F.V.O(mm)
(Ø24 eyepiece)

F.V.O(VxH,mm)
(1/2" chip sensor)

F.V.O(VxH,mm)
(2/3" chip sensor)

ELWD 2X PA 0.055 34.0 100 5.0 91 Ø 12 2.4 x 3.2 3.3 x 4.4
ELWD 5X PA 0.140 34.0 40 2.0 14 Ø 4.8 0.96 x 1.28 1.32 x 1.76
ELWD 10X PA 0.280 33.5 20 1.0 3.5 Ø 2.4 0.48 x 0.64 0.66 x 0.88
ELWD 20X PA 0.420 20.0 10 0.7 1.6 Ø 1.2 0.24 x 0.32 0.33 x 0.44
ELWD 50X PA 0.550 13.0 4 0.5 0.9 Ø 0.48 0.192 x 0.256 0.264 x 0.352
PLAN APO ELWD HNA Specification Details
N.A. W.D (mm) F (mm) R (μm) D.F (μm)

F.V.O(mm)
(Ø24 eyepiece)

F.V.O(VxH,mm)
(1/2" chip sensor)

F.V.O(VxH,mm)
(2/3" chip sensor)

ELWD 100X HNA 0.800 3.0 2.0 0.34 0.43 Ø 0.24 0.048x0.064 0.066x0.088
PLAN APO ULWD Specification Details
N.A. W.D (mm) F (mm) R (μm) D.F (μm)

F.V.O(mm)
(Ø24 eyepiece)

F.V.O(VxH,mm)
(1/2" chip sensor)

F.V.O(VxH,mm)
(2/3" chip sensor)

ULWD 50X 0.420 20.5 4 0.7 1.6 Ø 0.48 0.10x0.13 0.132x0.176
ULWD 100X 0.550 13.0 2 0.5 0.9 Ø 0.24 0.05x0.06 0.066x0.088
PLAN NIR Specification Details
N.A. W.D (mm) F (mm) R (μm) D.F (μm)

F.V.O(mm)
(Ø24 eyepiece)

F.V.O(VxH,mm)
(1/2" chip sensor)

F.V.O(VxH,mm)
(2/3" chip sensor)

NIR 20X 0.4 20.5 10.0 0.7 1.7 Ø 1.2 0.24x0.32 0.33x0.44
NIR 50X 0.42 19.0 4 0.65 1.6 Ø 0.48 0.096x0.128 0.132x0.176



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